In semiconductor manufacturing, ion implantation is a key process where impurities such as boron, arsenic, antimony, and phosphorus are injected into a wafer (a semiconductor thin plate that serves as the substrate for integrated circuits). During this process, these impurities are ionized and accelerated into an ion beam with high voltage, typically ranging from tens to hundreds of keV, and then implanted into the target wafer. Once implanted, the wafer undergoes high-temperature treatment, allowing the impurities to integrate into the crystal lattice, forming a doped semiconductor.

The resonator (cavity) is an acceleration device that uses RF signals to accelerate the ion beam extracted from the ion source to the desired energy level.

What is Resonator Repair Technology?

LESOWON offers comprehensive repair services for performance degradation and failures during the implantation process, using its proprietary technology and expertise. These services include thorough pre-inspections, overhauls, and impedance matching, ensuring optimal performance.

* Key Customers – Samsung Electronics, SK Hynix, and others.

Resonator Repair Process

Resonator Repair Model (Full Axcelis High Energy System)